- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/66 - Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
Patent holdings for IPC class G03F 1/66
Total number of patents in this class: 207
10-year publication summary
7
|
12
|
11
|
16
|
14
|
22
|
34
|
28
|
41
|
7
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Entegris, Inc. | 1736 |
40 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
31 |
Gudeng Precision Industrial Co., Ltd. | 125 |
25 |
ASML Netherlands B.V. | 6816 |
16 |
Nikon Corporation | 7162 |
7 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
6 |
Brooks Automation (Germany) GmbH | 74 |
6 |
ASML Holding N.V. | 542 |
5 |
Murata Machinery, Ltd. | 1386 |
5 |
Samsung Electronics Co., Ltd. | 131630 |
4 |
Applied Materials, Inc. | 16587 |
4 |
Mitsui Chemicals, Inc. | 3134 |
3 |
Boe Technology Group Co., Ltd. | 35384 |
3 |
Fine Semitech Corp. | 22 |
3 |
IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | 1115 |
3 |
Ordos Yuansheng Optoelectronics Co., Ltd. | 1232 |
3 |
Changxin Memory Technologies, Inc. | 4732 |
3 |
Tokyo Electron Limited | 11599 |
2 |
Hugle Electronics Inc. | 21 |
2 |
Industry-University Cooperation Foundation Hanyang University | 1001 |
2 |
Other owners | 34 |